IGM Resins will be at the Radtech UV/EB event. RadTech announces its 17th biennial conference and exhibition dedicated to UV/EB technology, set to take place March 8-11, 2020, at Disney Coronado Springs in Orlando, Florida.
IGM Resins will held 4 conferences:
New Product Debut Presentation
Monday, March 9, 10:00 AM – 10:15 AM – Track C
UV-Curable Acrylate Resins for Difficult Substrates
Tuesday, March 10, 3:30 PM – 5:30 PM – Track B – Chakrapani Srinivasan, IGM Resins USA
UV-curable coatings have penetrated applications hitherto dominated by conventional coating technologies. Applications on difficult substrates require specialized acrylate resins capable of maximizing adhesion to the substrates, coupled with exceptional physical properties (chemical and abrasion resistance). Examples include low surface energy BOPP films, variable wood substrates, luxury vinyl flooring, and electronic assemblies (high adhesion under adverse thermal and chemical conditions). We quantify the challenges, demonstrating how specific acrylate resins selections simultaneously optimize adhesion and physical performance.
Disilyl alpha hydroxy ketones: a novel class of photoinitiators
Wednesday, March 11, 8:00 AM – 10:00 AM – Track C – Marika Morone, IGM Resins Italy
Dynamic and continued growth of the UV curing industry is dependent to the support that technical innovation can give in overcoming new challenges, such as outflanking regulatory issues and in providing substances which are safer in use and provide performance benefits. In this paper, we will present a novel silicon-based class of photoinitiators, together with applications data and a proposed photolysis mechanism. These photoinitiators offer a possible longer-term alternative to the threatened class of alpha amino ketone photoinitiators.
Photoinitiator selection to advance the UV curing industry in an uncertain world
Wednesday, March 11, 10:15 AM – 12:15 PM – Track A – Stephen R Postle, IGM Resins USA
The UV curing industry stands at the brink of a number of compliance and performance challenges. Photoinitiators including acyl phosphine oxides and alpha amino ketones are under activist regulatory threat. In this paper, we will present alternates to workhorse photoinitiators like TPO, novel photoinitiator blends offering dual cure options , acrylated photoinitiators for ultra-low migration, and patented acyl phosphine photoinitiators offering superior performance for sensitive packaging, ink jet, wood coatings and other sectors.
Source: IGM Resins
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